SON & PARK
Beauty Full Mask Clean Type
Moisturizing mask contains hyaluronic acid and a blend of AHA from flower extract to help renew dull skin.
Not used by anyone yet
- Acne
- Redness
- Radiance
- Age spots
- Moisture
- Oiliness
- Texture
Ingredients (32)
| Ingredient | Function |
|---|---|
| Water | solvent |
| Methylpropanediol | solvent |
| Agave Americana Stem Extract | — |
| Althaea Rosea Flower Extract | — |
| Rosa Damascena Flower Water | — |