Eclado Laboratory
A.C Centella Mask
The mask helps to remove impurities from the pores while controlling sebum and providing moisture to the skin. Dimethyl Suffone, Centella Asiatica Extract, Houttuynia Extract and Tea Tree Leaf Oil help to regulate excessive sebum and relief acne troubled skin.
Not used by anyone yet
- Moisture
- Oiliness
- Age spots
- Redness
- Radiance
- Acne
Ingredients (34)
| Ingredient | Function |
|---|---|
| Water | solvent |
| Clay | viscosity-controlling |
| Dipropylene Glycol | solvent |
| Dimethyl Sulfone | — |
| Glycerin | skin-identical-ingredient, moisturizer-humectant |